A nanostructure pattern is created on the surface of high purity fused silica plano-convex lenses to produce a high quality antireflection effect. Because this manufacturing process uses no thin films materials, the lens has a very high damage threshold limit.
•High laser damage resistance for pulsed or CW applications
•Chemically and mechanically robust/contamination resistant
•Reflection loss down to 0.1%
•No surface absorption – reduced thermal lensing
•Improved beam parameters and long term stability
UV Fused Silica Substrates for UV, Laserline & Broadband Applications
UV Grade Fused Silica is synthetic amorphous silicon dioxide of extremely high purity providing maximum transmission from 195 to 2100 nm. This non-crystalline, colorless silica glass combines a very low thermal expansion coefficient with good optical qualities, and excellent transmittance in the ultraviolet region. Transmission and homogeneity exceed those of crystalline quartz without the problems of orientation and temperature instability inherent in the crystalline form. It will not fluoresce under UV light and is resistant to radiation. For high-energy applications, the extreme purity of fused silica eliminates microscopic defect sites that could lead to laser damage. For more information, refer to our optical materials Technical Note