Gas diffuser GasShield®

Mott Gasshield gas diffusers deliver uniform and laminar gas flows, minimizing particle disturbance. They effectively remove particles greater than 0.0015 μm, enhancing wafer quality, and offer longevity for over 6,000,000 cycles, making them a reliable choice for semiconductor manufacturing. Typical Applications Chamber Diffusers are used for venting in the following applications: » load lock chambers » transfer chambers » cooling chambers, and » process chambers of semiconductor equipment interfaces (CVD, PVD, Etch, Epi) or other vacuum chambers Operating Conditions - » Max Operating Pressure: 60 psig (4.2 barg) » Max Operating Temperature for Inert Gas 860°F (460°C) without o-ring 212°F (100°C) with o-ring » Max Differential Pressure: 75 psid (5.0 bar) Materials - » Hardware: 316L SS or Alloy 22* » Filter Medium: 316L SS Fiber or Alloy 22* » Wetted Hardware Surface Finish: 10 Ra *Alloy 22 or UNS NO6022 is a nickel-chromium-molybdenum super-alloy commonly referred to as Hastelloy® C-22® Specifications - Particle Removal Size - ≥ 0.0015 μm Particle Shedding: - Zero particle contribution above background (<1 particle/ft³) per SEMI F43-0308 test method