The Method for the Determination of Thermal Diffusivity in the Thickness Range of Nanometer
With the significant progress in the design of electronic devices and the associated need for an efficient thermal management, accurate thermal diffusivitv / thermal conductivitv measurements in the nanometer range are more than ever crucial.
The National Institute of Advanced Industrial Science and Technology (AIST), Japan, already responded to industrial requirements with the development of a "pulsed light heating thermoreflectance method" in the early 90's. PicoTherm Corporation was established in 2008 with the launch of a nano-second thermoreflectance apparatus "NanoTR" and a pico-second thermoreflectance apparatus "PicoTR", which allows for absolute measurements of the thermal diffusivitv of thin films in a thickness range of several 10 pm down into the nanometer range.
In October 2020, PicoTherm joined the NETZSCH Group as a subsidiary of NETZSCH Japan. In combination with our LFA systems, NETZSCH can now offer the solution for thin films in the nanometer range up to bulk materials in the range of mm.
With the significant progress in the design of electronic devices and the associated need for an efficient thermal management,