Contact angle measuring instrument SURFTENS HL

processfor the semiconductor industry

SURFTENS HL - professional wafer testing in semiconductor technology The contact angle meter SURFTENSHL is designed for use in semiconductor industry and research, in particular for process control of wafer coating and in the photolithographic process. It is characterized by the following features: fast and easy measurement of contact angle, space-saving construction special table construction for fast mapping of contact angle distribution on the wafer software with intuitive operation comfortable documentation of the measuring results in protocols and in the video images, if required computation of free surface energy by the theory of Wu / OWRK optional use with laptop or PC SURFTENS HL - applications The modification of the wetting behavior of silicon wafers is a standard process step in the semiconductor technology. For process characterization, adjustment of technological parameters and production control. It is therefore absolutely necessary, to measure the contact angle and the surface free energy objectively and accurately before and after the modification process. For this purpose a robust and easy to use contact angle measuring instrument is needed. SURFTENSHL was developed to meet the needs in semiconductor technology and research The operation is simple and for everybody possible after a short training. The manual operation ensures an attractive price. Thus SURFTENSHL is used as well as in standard process control as well as in research and development.