Lithography system for the semiconductor industry JetStep® G45

The JetStep G45 System addresses the demanding requirements of the mobile display industry. Based on established stepper technology, the system combines optimized performance capabilities with superior cost of ownership. Product Overview The JetStep G45 System features 200mm. Low distortion optics combined with high-speed precision motions enables the system to achieve overlay of <0.5μm. The JetStep G45 system magnification optics allow for the use of a 6-inch reticle (mask), significantly reducing the tooling cost when compared to competing technologies. Additionally, the system features a small footprint, minimizes facility cost, and its frictionless motions reduce wear which lowers maintenance costs. The combined savings result in an affordable manufacturing process with reduced CAPEX and low Cost of Ownership (COO). Specifications • High-fidelity projection lens and illumination system for resolution to 1.5µm • Industry standard 6-inch reticle format for cost efficient manufacturing • Automated magnification control increased process window • On board reticle management system to provide maximum utilization • On board metrology package for insitu calibration • On the fly autofocus at every exposure site to automatically adjust focus over panel topology • On board diagnostics that provide feedback on system performance and troubleshooting