- Metrology - Laboratory
- Metrology and Test Equipment
- Wafer metrology system
- Onto Innovation Inc.
Wafer metrology system The Atlas XP+
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Characteristics
- Type
- for wafers
Description
The Atlas thin film and OCD series is the metrology tool for leading-edge FinFET, gate-all-around (GAA) FET, 3D NAND, and advanced DRAM device manufacturing.
Atlas XP+ system offers a single platform for both thin film and OCD measurements for 200mm wafer metrology. The system incorporates a dual-arm robot, high-precision stage and high-speed focus system. The system also features advanced pattern recognition, improved thickness reproducibility and superior SR and SE throughput. The N2000™ software interface and advanced automation are compliant with standards adopted by SEMI and other organizations. The NanoNet® feature, a network component of the N2000 Analysis Platform software provides system-to-system matching and seamless recipe transferability.
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