Wafer metrology system NanoSpec® II

Wafer metrology system - NanoSpec® II - Onto Innovation Inc.
Wafer metrology system - NanoSpec® II - Onto Innovation Inc.
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Characteristics

Type
for wafers

Description

Available in both tabletop and standalone configurations, the Nanopsec II film analysis system closes the loop between engineering and research activity and final production use of recipes and analysis algorithms. Product Overview Extending the range and performance of the industry proven NanoSpec series, the NanoSpec II introduces a new design with automated sample alignment, fast autofocus and measurement repeatability better than 1Å*. The system can be incorporated with Onto Innovation’s spectroscopic reflectivity analysis software, image processing for automated pattern alignment and various optical configuration options, making the NanoSpec II automated the most powerful thin film system in its class. The NanoSpec II is fully compatible to material cards of previous generations of Nanospec products. Additionally, many dispersion models created by Woollam® ellipsometers can be imported and used without conversion. Available in both tabletop and standalone configurations, the Nanopsec II closes the loop between engineering & research activity and final production use of recipes and analysis algorithms. Easy recipe portability allows development of recipes outside the production line without disturbing the standard production flow. Various options for offline data analysis enable engineers to re-process excursions within the process at any time, even if the original sample is no longer available. The optics have been designed to provide reliable and robust metrology while keeping the maintenance efforts at minimum.

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.