PVD deposition machine PL1011 G4

he PL1011 G4 represents the next generation of a robust PVD coating unit from PLATIT for customers who seek a combination of process reliability and high-quality coatings at a low cost per tool. Its new design speaks for changes and modernization: the simpler construction enables better service; the new technological features such as the Plasma-Nitriding and Double-Pulsed options improve the coating properties and process for various applications. As the backbone of every high-volume coating center, PL1011 G4 combines maximum production availability with a user-friendly interface and an efficient maintenance concept. It’s equipped with four Planar cathodes utilizing the latest ARC technology for the deposition of all PLATIT standard coatings in consistently high quality. 4 x Planar cathode using ARC technology for depositing LGD® (Lateral Glow Discharge) Plasma etching with argon, glow discharge Metal ion etching (Ti, Cr) Max. coating volume [mm]: ø715 x H805 Max. coating height with defined coating thickness: 711mm Max. load: 400kg 3-4 batches/day 1 to 12 axes PLATIT SmartSoftware (PC and PLC system) with touch screen Statistics and help function via user interface Data recording and real-time display of process parameters and flow Manual and automatic process control Remote diagnostics and maintenance Newly designed recipe editor Footprint [mm]: W4000 x D2250 x H2350 Footprint Double-Pulsed option [mm]: W4700 x D2250 x H2350