PVD deposition machine Pi111 PLUS G3

The Pi111 PLUS G3 is the third generation of PLATIT’s small PVD coating unit. It offers short cycle times, simple operation and high user-friendliness at an attractive price – without compromising on coating performance. Thanks to two rotating cathodes with arc technology, the unit enables to deposit selected PLATIT Signature Coatings in reproducible high-quality. The Pi111 PLUS G3 is the best choice for customers looking for a high-quality entry into the coating world or those who want to add a fast, low-volume PVD unit to their machinery. Technology 2 x LARC® PLUS cathode (LAteral Rotating Cathode) for arc coating Compare the advantages of LARC® PLUS cathodes versus LARC® cathodes: Up to 30% improved target utilization Increased deposition rate thanks to optimized magnetic field system Quick cathode exchange Etching processes Several etching technologies can be used with the PLATIT Pi111 PLUS G3 coating unit, offering various advantages: LGD® (Lateral Glow Discharge) Plasma etching with argon, glow discharge Metal ion etching (Ti, Cr) Load and cycle times Coating volume: max. ø353 x H498mm Coating height with defined coating thickness: max. 414mm Load: max. 160kg Batches/day: 4-5 Modular carousel systems Carousel with 2 kickers or Triple-rotation gearbox system Software PLATIT SmartSoftware (PC and PLC system) Easy operation and maintenance Modern user interface with menu navigation on touch screen Real-time process visualization incl. data recording and data management Manual and automatic process control Remote diagnosis and maintenance possible