PVD deposition machine Pi411 PLUS

With its modular design and wide range of available technologies, the PLATIT Pi411 PLUS is the most flexible PVD coating unit in the world. The basic configuration as an arc coating unit with three rotating cathodes in the door can be modularly adapted on site. It can be upgraded with an arc or sputtering central cathode, as well as PECVD, and OXI processes. Also unique to the coating unit is the LACS® hybrid technology, which allows to coat simultaneously using arc and sputter technologies. Multiple configuration options and the high flexibility based on the rotating cathodes allow you to develop customized PVD coatings at the highest level of performance. This coating unit is therefore the ideal choice for customers who do not want to make any technological compromises and value maximum flexibility and performance. Technology The PLATIT Pi411 PLUS PVD coating unit offers you several technology options to choose from: ECO Basic configuration: 3 LARC® (LAteral Rotating Cathode) cathodes in the door for arc coating PECVD (DLC2) For a-C:H:Si coatings TURBO ECO configuration + CERC® cathode (CEntral Rotating Cathode) with arc coating technology for increased productivity as well as for highly complex coatings OXI For oxide PVD coatings with a corundum structure SCIL® High-performance sputtering from the central cathode Hybrid LACS® Simultaneous arc and sputter processes with LARC® cathodes in the door and central SCIL® cathode Etching processes Several etching technologies can be used with the PLATIT Pi411 PLUS coating unit, offering various advantages: LGD® (Lateral Glow Discharge) Plasma etching with argon, glow discharge