PVD deposition machine PL2011

With the PLATIT PL2011, we offer you an arc coating unit capable of handling particularly large batch volumes. A specially designed carousel with 5 different configurations allows maximum load flexibility while maintaining coating quality. This unit can coat either a large number of tools with either small or large diameters or mixed loads in one batch. PL2011 is designed for PVD coating of tools up to a diameter of 1423mm. The carousel can be loaded up to 1800kg. PL2011 is based on the double-pulsed function of PL1011G4. This increases the coating speed by 30% compared to the standard process. Pulsed cathodes allow smoother PVD coatings due to improved arc distribution. The use of arc power supplies on alloyed targets improves deposition rate and coating distribution, ensures more uniform target erosion, and extends the life of the target material. Technology 6 planar arc cathodes, 4 of which have pulsed arc power supplies to allow pulsing of the cathodes Etching processes The PLATIT PL2011 coating unit allows the use of three different etching processes: LGD® (Lateral Glow Discharge) with 2 cathodes with shutter and 2 cathodes acting as anodes Plasma etching with argon, glow discharge Metal ion etching (Ti, Cr) The PVD coating unit has 2 doors, providing perfect access to the chamber. This simplifies machine and cathode maintenance and speeds up loading and unloading: While the finished batch is removed through one door, the next batch can be loaded through the other door. In addition, the always correct alignment of the carousel carriage by means of a track system facilitates the loading and unloading of substrates up to max. 1800kg.