PVD deposition machine magnetron sputteringthin-filmvacuum
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Characteristics
- Method
- PVD
- Technology
- magnetron sputtering
- Deposition type
- thin-film
- Other characteristics
- vacuum, online
- Applications
- for the microelectronics industry, automotive
Description
Continuous magnetron sputtering coating production line
Through magnetron sputtering low-temperature film formation method, assisting high-pressure ion bombardment, Dy and Tb coatings are quickly plated on neodymium iron boron materials, and high-performance magnetic materials are obtained through grain boundary diffusion technology, which saves the amount of heavy rare earths and reduces the amount for enterprises product production cost.
According to production requirements, our company makes special design plans for target utilization, coating conversion rate, deposition rate, production efficiency and other issues. Satisfy customers' cost control and provide comprehensive solutions.
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.