Ion source Anode ion source

Anode ion source (bar ion source) Without filament, grid and neutralization grid, it can operate and produce stably without maintenance for a long time.Very high mean time between failures and very low maintenance costs.The temperature change of the coating environment is small, especially beneficial for the coating of temperature-sensitive substrates.Wide range of working pressure and energy adjustment.Combining the space requirements of the base frame and the installation mode, a customized large-area ionization source can be realized. 1.Non-metallic substrate cleaning: cleaning the surface contaminants (oxides, hydrocarbons, etc.) of the substrate, increasing the bonding force of the film base, reducing substrate defects, increasing the surface energy of the substrate, etc. 2.Improve gas ionization rate: ionize the working gas as ion-assisted deposition in the magnetron sputtering process, and at the same time improve the migration and diffusion ability of the film particles on the surface, which is beneficial to the formation of a dense film structure. 3. Deposition film: Direct deposition of DLC and optical films, oxides, nitrides, etc.