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Wafer cleaning system
waterautomaticfor the semiconductor industry

Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 2
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 3
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 4
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 5
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 6
Wafer cleaning system - RENA Technologies GmbH - water / automatic / for the semiconductor industry - image - 7
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Characteristics

Technology
water
Operational mode
automatic
Applications
for the semiconductor industry, for wafers

Description

Clean wafers are the basis for excellent semiconductor products. The fully automated RENA Final Cleaning System provides highest quality surfaces for the last wafering step. Sophisticated processes and advanced scheduling make it the perfect solution for semiconductor wafer production with high throughput and challenging requirements. Features and benefits Superior surface cleanliness for wafers up to 300 mm Fully automated handling carrierless or with LMC carrier Perfect finishing with RENA Marangoni Dryer Standard SEMI interfaces for easy fab integration
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.