Immersion wet bench Advancer

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For single-step wet processing of semiconductor wafers, RENA offers the semi-automated “Advancer” family. These immersion equipment are robust, field-proven and highly configurable with remarkably low footprint. “Advancers” are an ideal solution for single-step etching, cleaning and resist striping processes of semiconductor surfaces. The “Advancer” family consists of three platforms: Micro, Classic and Gemini. The “Advancer Micro” and “ Advancer Classic” possess one process and one rinse tank with sidewall linear robot for single-step processes. The “Advancer Gemini” is dual-process, dual-robot wet bench and one of the most cost-effective platforms available. The “Advancer Gemini” can be employed either to double the processing capacity or to perform sequential process steps with reduced overall footprint and cost. RENA systems provide outstanding process control and monitoring using the IDX Flexware software with advantageous features and capabilities. All RENA systems are maintenance friendly and compliant to the SECS/GEM interface of factory host. Features and Benefits Dry-to-dry Capability Single-Step process and rinse design Single or dual cassette handling 50mm to 200mm wafer sizes 150 and 200mm processing without changes IDX Flexware Process Control Software Intuitive HMI Touchscreen Highly serviceable, side-mounted robot SECS/GEM Interface Options Flexible and Upgradeable Tailored to Customer Specification