Cleaning dryer Genesis

spraybatchrinsing

The RENA Genesis Marangoni dryer combines drying process with cleaning and rinsing, providing a one-step process. Genesis is a patented technology providing outstanding wafer cleanliness and water removal. These dryers can be applied both as standalone platforms or as integrated into batch immersion wet benches. The entire process is monitored and controlled by RENA’s exclusive IDX Flexware process control software. RENA’s Marangoni dryer offers superior performance, improved yield and reduced particle presence. Features and Benefits Cost effective Robust, efficient and clean Manual or automated wafer handling Wafer sizes 50 – 200 mm Teflon cassettes Dries hydrophobic and hydrophilic surfaces No damage to photo resist Low IPA usage (< 20 ml per dry cycle) Superior particle performance Typical cycle time 7-20 minutes Integrated DI water filtration option Optional chemical injection Optional IPA recirculation for more robust particle performance