Throughput: 12000-16000 wafer/hour
Breakage rate: M10<0.01%/M1298%
Characteristics:
Alkaline polish for TOPCon, BC, HJT high-efficiency solar cells
Used for polishing, etching and cleaning treatment
Nano-bubble cleaning to achieve efficient cleaning of the surface of silicon wafer
With dry clean area and self-cleaning system
Avoid cross-contamination and reaction overtime
Upgrade related materials to avoid precipitation of impurities
Suitable with MES and RFID function
Intelligent equipment, energy consumption statistics and analysis function