- Industrial machines and equipment
- Surface Treatment Equipment
- Dry cleaning machine
- RoboTechnik Intelligent Technology Co., Ltd.
Dry cleaning machine Maximus806automaticprocess
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Characteristics
- Technology
- dry
- Operational mode
- automatic
- Applications
- process
Description
Fully automated micro cluster system for process stations, e.g.
Stripping
Spin coater
Developer
Lift-Off
Hot, cool and primer plates
UV baking
Max. wafer size: Ø 6“~ Ø 8“ ((Ø 150 ~ Ø 200 mm)
Max. substrate size: 6“ x 6“ (150 mm x 150 mm
Modular design for up to 6 process stations`
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Semiconductor
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.