Deposition of tunnel oxide layer, i-Poly and D-poly for TOPCon solar cells.
• Low pressure and hot wall process characteristics, with better film uniformity and good compactness.
• LPCVD process, densely loaded substrates have little effect on the coating rate, with large loading capacity in single tube.
• More temperature zones to ensure the uniformity between wafers reliably.
• Independently adjustable segmented air inlet to compensate for the airflow depletion effect.