Oxygen gas purifier M

floor-standing

The machine is treated with O2 to remove impurities like CH4, CO, CO2 and H2O. They are used in Chemical, optic fibers , nuclear industries and laboratories. The outlet impurities level offered is 1 ppm. The principle used is Catalysis + adsorption. The feed gas actually passes through a very special catalyst at high temperatures so that hydrocarbon, H2 and CO can be converted into CO2 and water They are then adsorbed by an adsorbent layer.