The OntosTT, proposed in 2 versions – 200 mm and 300 mm , is a table-top semi-automatic atmospheric plasma system for surface preparation.
2 sizes of plasma head are available – 25 mm and 40 mm.
It provides a simple, effective, clean surface modification method which does not require the throughput-robbing vacuum chamber associated with traditional plasma systems.
It performs this surface modification without ion bombardment and without the cross-contamination issues often associated with conventional plasma systems.
The OEM version of the ONTOS plasma head is available for integration into third party equipment.
3 sizes of plasma head are available – 10 mm, 25 mm and 40 mm.
The OntosIS system is available on the FC300 Flip-Chip Bonder.
• Downstream radical chemistry only
• CMOS safe, detector safe
• Fast process – continuous throughput capable
• Non-toxic, dry process. OSHA and EPA-friendly
• Surface preparation for bonding
• Photoresist residue removal
• Photomask cleaning
• Native oxide removal from semiconductor surfaces
• Organic contamination removal prior to adhesive bonding
• Pre-plating surface preparation
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