DC/DC power supply EIB

multiple-outputISOmodular

TYPICAL APPLICATION Transmission scanning electron microscopy,Scanning electron microscopy,Semiconductor analysis,Milling and repair,Ion beam etching,Focused ion-beam lithography Wisman's EIB series is a comprehensive multi-output high-voltage power supply dedicated to focusing ion beams. Typical applications include transmission and scanning electron microscopes; semiconductor analysis, milling and repair of optical drive heads, ions; beam etching and focused ion beam lithography. The modular design method allows individual components to be easily configured and assembled on a large chassis in a common rack. Interface, logic and control circuits are surface mount technology to minimize cost and size. Integrate acceleration power supply, filament power supply, absorb polar power, inhibit polar power and lens power. Ultra-low output ripple, excellent adjustment rate, stability, temperature drift and accuracy. Patented high-voltage suspension and digital control technology. The EIB series of high-precision modules are competitively priced and are ideal for OEM applications. Accelerator Power Supply : Output current: 30μA Ripple: 200 mV P-P, from 0.1 Hz to 1MHZ Line regulation: input change + / -10% for 100mV Load regulation: ± 0.01%, maximum voltage, full load change Stability: 1.5V/10 hours after warming up for 2 hours Temperature coefficient: 25 PPM / °C Filament power supply Output voltage: 0 to 5 VDC Ripple: 10mA P-P, from 0.1 Hz to 1MHZ Line regulation: + / -10% change to 5mA Load regulation : ± 0.1%, maximum voltage, full load change Stability: 5mA/10 minutes after warming up for 2 hours Temperature coefficient: 200 PPM / °C