DC/DC power supply EBL

single-phasewith short-circuit protectionwith overload protection

TYPICAL APPLICATION Micro optics,Semiconductor lithography,Semiconductor Exposure Machine,Mask Wisman's EBL high voltage power supply is designed for precision electron beam applications, such as semiconductor nanolithography, micro optics and development mask work. It has ultra-low ripple and excellent stability specifications, which is very suitable for application which has very strict demanding. Provide selectable low output current and high output current range. The high-voltage part of the solid encapsulation eliminates any user maintenance issues while isolating the components from environmental variables. The device is fully overload, arc and short circuit protection. Provide remote control programming and monitoring functions. Allows accurate passive measurement of high voltage output. Optional USB2.0, network port, RS-232, RS485 digital communication, can be customized according to user requirements. SPECIFICATION Voltage regulation :±0.001% of the rated voltage within the specified input voltage range Load regulation: ≤20V, current changes from 25μA to 60μA and 60μA to 25μA ripple: Peak-to-peak value≤70mV High voltage micro discharge: Less than 200mV stability: After 6 hours of preheating, 0.001% every 8 hours, the temperature is 20℃±0.2℃ Temperature Coefficient:25ppm per degree Celsius in the range of 10°C to 40°C Environmental: Operating temperature: 0 to 40 degrees Celsius Storage temperature: -40 to 85 degrees Celsius Humidity: 10 to 90% RH, no condensation Cooling: Convection cooling Front panel: Power on/off switch HV ON / OFF switch HV ON/OFF indicator