Vacuum deposition machine RT-Multi950

PVDPECVDsputtering

The Multi950 machine is a customized multiple function vacuum deposition system for R&D.  After intense exchanges with Shanghai University’s team lead by Professor Chen, we finally confirmed the design and configuration to fulfil their R&D applications. This system is able to deposit transparent DLC film with the PECVD process, hard coatings on tools, and optical film with sputtering cathode. Based on this pilot machine design concept, we have developed 3 other coating systems afterwards:   1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213 2. Ceramic Direct Plated Copper-  DPC1215  3. Flexible Sputtering System-  RTSP1215 These 3 machines all have an Octagonal chamber, which allow flexible and reliable performances in various applications. It satisfies the coating processes and requires many different metal layers: Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other non-ferromagnetic metals. Plus the Ion source unit, efficiently enhances films adhesion on different substrate materials with its plasma etching performance and, the PECVD process to deposit some carbon-based layers.  The Multi950 is the milestone of advanced design coating systems for Royal Technology. Thanks to students of Shanghai University and Professor Yigang Chen leading them with his creative and selfless dedication, were we able to convert his valuable information into a state of the art machine. In the year 2018, we had another project cooperation with Pressor Chen, the C-60 material deposition by  Inductive thermal evaporation method. Mr. Yimou Yang and Professor Chen were fundamental for these innovative projects.