PVD deposition machine RTSP-1250

magnetron sputteringthin-filmmetalized film

1. Magnetron sputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. 2. The Magnetron Sputtering Coating Equipment- batch type contains the follow key components: Magnetron Sputtering Cathode: Cylinder or Planar Type; Power Supply: Pulse DC, MF, RF Ion source: generally for the plastic/glass/ceramic/metal parts for glow discharging, plasma cleaning. Bias Power Supply: only works on the conductive work pieces: steel, iron, steel alloy, zamak, aluminum alloy, brass etc. Vacuum Pump Package: Rotary Vane Pump, Rotary Piston Pump, Roots Pump, diffusion pump/turbo molecular pump, holding pump etc. Others: Gate vales/vacuum gauges, MFC, vacuum fittings and vacuum piping line, feed through, 3. RTSP series coating equipment is used for the production of conductive, non-conductive functional coatings, aesthetic purpose. A. Applications: ITO coatings on glass for touch screens, displays; architectural glass; automotive industry: car wheels & rims, car mirrors, head lamps, tail lights, plastic interior & exteriors; tableware & kitchenware, jewelry, sport and toys, water-electroplating replacement. B. Coating materials: Metals: Ti (Titanium), Cr Chromium), Zr (Zirconium), Cu (Copper), Al (Aluminum), Ni (Nickel), SUS316 (Stainless steel) ... Metal Alloys: Ti-Al alloy, Ni-Ca alloy (Nickel - Cadmium), ITO (Indium Tin Oxide) C. Sputtering methods: DC/MF/RF D. Feature: low-temperature deposition