PVD deposition machine RT-R2R-SP

magnetron sputteringion beam-assistedthin hydrophobic film

We are pleased to propose our MultiWeb-Series Roll to Roll Vacuum Sputtering Web Coater to meet your multi-layer deposition requirements. Low-E Film Web Coater Applications: electronic paper, flexible circuits, photovoltaic, medical strips, RFID (Radio Frequency Identification) and Low-E film. DEPOSITION FILMS 1. Substrate material: PET, PEN, PES, PI, PC, PA,... Films 2. Substrate thickness: 15~300μm 3. Deposition methods: AC Reactive for SiO2(Dielectric); Pulsed DC for ITO (Metal & Conductor) 4. Oxide conductor TCO: ITO, AZO, IZO... 5. Metal conductor: Al, Cu, Mo, Ag... 6. Optical film: Ta2O5, Nb2O5, SiO2, TiO2... 7. Semiconductor: ZnO, InGaZnO... 8. Insulator: SiO2, SiNx, AlOx, AlNx... 9. Uniformity: ±5% Across Web The MultiWeb Coater provides the following key features: A. One chamber divided into multi-pressure zones to accommodate various deposition sources. B. Multi-Source simultaneous deposition capabilities in one web pass, for multi-layer coating. C. Reversible web winding direction enables deposition of unlimited layers without breaking vacuum. D. Precision web handling mechanisms with edge-guide to allow multiple passes without loss of alignment. (Optional) E. AC Invert web drive system for accurate control of multiple web speeds. F. In-line optical and/or resistance thickness monitoring systems, to control precise deposition thickness and uniformity. (Optional)