PVD deposition machine CsI950

arc evaporationmetalized filmvacuum

CsI950 High Vacuum Deposition System is exclusively designed for CsI and TII metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance: Ultra- High Spatial Resolution of Imaging; Fast response for sharper imaging; Class leading edge-to-edge image areas; Optical absorb layers or reflector layers; Low patient X-ray dose. Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic. Technical Advantages Royal Technology provides 2 models machine: CsI950 and CsI950A+ The model CsI950A+ is updated based on the 1st generation CsI950, its advantages: 1. Efficiency -CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model. -Double-capacity for max. size substrate: 500 x400mm. 2. Repeatability & Reproducibility -Through high precised parameter control system, -Automated process control software and program, -User friendly operation. 3. Reliability -24/7 days non-stop operation; -Inficon Film Thickness Controller to monitor the film thickness inline. -Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control -Rotary racks equipped with Servo-Motor for high accuracy and stability.