The compact film thickness monitor is a reflection spectrophotometric film thickness meter that uses a small reflection probe and is applicable in all situations from the laboratory level to in-line 100% inspection in the production process. It has excellent maintainability and can be used for incorporation into process equipment and line management.
Simultaneous measurement of up to 9 types of transparent films is possible.
It can be used as an in-line or end-point monitor for the various multi-layered film process.
The compact probe can be installed in a small space inside the process tool. It is also possible to judge the mixture ratio of the mixed layer or the crystallinity of Poly-Silicon by using the EMA theory.