Rotary magnetron CM
flatfor ion sputtering

Rotary magnetron - CM  - Sputtering Components - flat / for ion sputtering
Rotary magnetron - CM  - Sputtering Components - flat / for ion sputtering
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Characteristics

Options
rotary, flat, for ion sputtering

Description

The CM is our most compact external-mount end block. It can handle targets up to 1000 mm and has a power rating of up to 20 kW DC or 80 kHz MFAC. The CM external-mount end block combines high-performance and reliability in a very compact and lightweight design. Features Customizable drive shaft length Compact and flexible design Easy access water seal cartridge Patented power-delivery technology Patented target water fill and drain Simple design for fewer parts Magnet bar externally adjusts to any angle Benefits Wider substrate coverage than internal end blocks Fits most chamber designs All utilities are external and remain attached during target changeover High-packing density; dual cathodes in 220 mm space (with an 80 mm ID target) Drive motors can be mounted mount up or down and inward, or outward High-power with no inductive heating impact - no brush dust Fast, simple, in-house maintenance Allows co-sputtering, tighter plasma coupling, and limits shield coating

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.