High-resolution rotary stage with aperture
HV / UHV, DUV, cleanroom ISO 6, n x 360°, rep 0.0005°, 3 kg load, speed 270°/s
• - Cleanroom: variants up to class ISO 6 (higher on request)
• - Vacuum: all ranges HV / UHV up to 10-11 mbar
• - Lubrication liquid up to 10-8 mbar / special configuration dry up to 10-11 mbar
• - Max. Bakeout temperature: 100°C
Optionally configurable:
• - Available in magnetic and low magnetic versions (magnet-free as a special
configuration)
• - Material selection and lubrication adapted to the application
• - Optional with controller FMC400/450
• - Customized development with 3D design, prototypes, series production
High-resolution imaging under limited installation space
This compact and flat rotary stage achieves extremely high resolutions in vacuum during fast processes. The 36 mm transmitted light allows precise positioning, measurement and analysis of small samples. It can be combined into demanding multi-axis systems and is easily controlled by our FMC 400/450 controllers.
Fields of application
High precision and dynamic microscopy e.g. AFM, electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, laboratory microscopy, imaging systems, sample analysis, beamline instrumentation, synchrotron, material research, material analysis