Rotary positioning stage DT155

piezo1-axiscompact

High-resolution rotary stage with large aperture UHV, DUV / EUV, cleanroom ISO 6, n x 360°, rep 0.0003°, speed 300°/s, load 5 kg • - Cleanroom: variants up to class ISO 6 (higher on request) • - Vacuum: all ranges HV / UHV up to 10-11 mbar • - Lubrication: liquid up to 10-8 mbar / dry up to 10-11 mbar • - Max. Bakeout temperature: 100°C Optionally configurable: • - Available in magnetic and low magnetic versions (magnet-free on request) • - Material selection and lubrication adapted to the application • - Optional with controller FMC400/450 • - Customized development with 3D design, prototypes, series production High precise and dynamic imaging This compact and flat rotary stage achieves extremely high resolutions in vacuum during fast processes. Due to the large transmitted light of 79 mm / 3", even large samples can be precisely positioned, measured and analyzed. It can be combined into sophisticated multi-axis systems and can be easily controlled via our FMC 400/450 controllers. Fields of application High precision and dynamic microscopy e.g. electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, beamline instrumentation, synchrotron, materials research, materials analysis, wafer inspection, semiconductor quality control, semiconductor research