Rotary positioning stage DT230

motorized1-axisfor microscopes

High-resolution, stable aperture rotary stage UHV, DUV / EUV, cleanroom ISO 6, n x 360°, rep 0.0002°, speed 180°/s, load 15 kg • - Cleanroom: variants up to class ISO 6 (higher on request)) • - Beam: UV, DUV, EUV (X-ray, gamma on request) • - Vacuum: all ranges HV / UHV up to 10-11 mbar • - Lubrication: liquid up to 10-8 mbar / dry up to 10-11 mbar • - Max. Bake-out temperature: 120°C Options: • - Available as magnetic, low-magnetic, magnet-free version • - Material selection and lubrication adapted to the application • - Version for cleanroom, laboratory or production • - Optional with FMC400/450 controller or PLC connection • - Customer-specific development with 3D design, prototypes, series production Fields of application High-resolution, outstanding stable inspection / microscopy, e.g. AFM, electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, transmitted light measurements in semiconductor technology, wafer inspection, laboratory microscopy, imaging systems, sample analysis, beamline instrumentation, synchrotron, materials research, materials analysis