• Vacuum: all ranges HV / UHV / EUV up to 10-11 mbar
• Lubrication liquid up to 10-8 / dry up to 10-11 mbar
• Max. Bakeout temperature: 120°C
• Aperture: 80 x 80 mm
Optionally configurable:
• With and without measuring system
• Optionally with lead screw drive or lubricated ball screw drive for higher speeds
• Can be combined with rotary tables (e.g. DT155) for rotary applications
• Material selection and vacuum lubrication adapted to the application
• Individual adaptation to the installation situation in the chamber
• Design for clean room ISO 14644-1 (up to class 1 on request)
• Optionally with controller FMC400/450
Highest stability in the nanometer range, even in dry operation
The positioning system with aperture for transmitted light has been combined from two LT300 linear stages to form a precise and heavy-duty XY stage for applications in high vacuum, ultra-high vacuum and under extreme ultraviolet radiation. The system runs completely lubricant-free. Its concept of crossed roller guides and lead screw enables enormously high stability in the nanometer range. Optionally, this system can be designed with lubricated ball screw drives for higher speeds.
Fields of application
Precision positioning of heavy loads, research in ultra-high vacuum and under extreme ultraviolet radiation, sample preparation, sample scanning, sample handling, biochips, camera alignment, materials research, materials analysis, beamline, accelerator, synchrotron