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Vacuum-compatible stage LT300 series
linearmotorized1-axis

vacuum-compatible stage
vacuum-compatible stage
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Characteristics

Orientation
linear
Type
motorized
Number of axes
1-axis
Other characteristics
high-accuracy, vacuum-compatible, for microscopes, for heavy loads, with built-in stepper motor, with controller, for wafer handling, laboratory jack, crossed roller
Stroke

50 mm, 100 mm
(1.969 in, 3.937 in)

Speed

5 mm/s

Repeatability

Max.: 4 µm

Min.: 0.5 µm

Description

• Vacuum: all ranges HV / UHV / EUV up to 10E-11 mbar • Lubrication liquid up to 10E-8 / dry up to 10E-11 mbar • Max. Bakeout temperature: 120°C • Clean room class 4 ISO 14644-1 (up to class 1 on request) • Very long lifetime, even with dry running Optionally configurable: • Available with piezo break • Material selection and vacuum lubrication adapted to the application • Individual adaptation to the installation situation in the chamber • Version for clean room ISO 14644-1 (up to class 1 on request) • Optional with controller FMC400/450 Stability in the nanometer range even high loads up to 10 kg The linear stage is designed to position loads with high rigidity under extreme conditions, such as in high vacuum and ultra-high vacuum. Equipped with a piezoelectric caliper brake, this positioning system achieves stability in the nanometer range. Fields of application Semiconductor technology in ultra-high vacuum and under extreme ultraviolet radiation, wafer alignment, wafer inspection, camera alignment, sensor alignment, inspection of contacts, alignment of mirrors, probing, vacuum chambers, research, beamline instrumentation, electronics assembly and inspection, high-precision scanning applications

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.