• Vacuum: all ranges HV / UHV / EUV up to 10E-11 mbar
• Lubrication liquid up to 10E-8 / dry up to 10E-11 mbar
• Max. Bakeout temperature: 120°C
• Clean room class 4 ISO 14644-1 (up to class 1 on request)
• Very long lifetime, even with dry running
Optionally configurable:
• Available with piezo break
• Material selection and vacuum lubrication adapted to the application
• Individual adaptation to the installation situation in the chamber
• Version for clean room ISO 14644-1 (up to class 1 on request)
• Optional with controller FMC400/450
Stability in the nanometer range even high loads up to 10 kg
The linear stage is designed to position loads with high rigidity under extreme conditions, such as in high vacuum and ultra-high vacuum. Equipped with a piezoelectric caliper brake, this positioning system achieves stability in the nanometer range.
Fields of application
Semiconductor technology in ultra-high vacuum and under extreme ultraviolet radiation, wafer alignment, wafer inspection, camera alignment, sensor alignment, inspection of contacts, alignment of mirrors, probing, vacuum chambers, research, beamline instrumentation, electronics assembly and inspection, high-precision scanning applications