3-axis positioning system 782462:002.26

linearfor the semiconductor industryfor wafer handling

Yield maximization in the smallest possible construction space This high-precision positioning system has been specifically designed as a complementary polarization filter for miniaturization and automation in EUV lithography. It maximizes the exposure quality as well as the yield of an existing wafer stepper in a very limited space of about 120 x 180 x 31 mm. For this purpose, three independently positionable filters are shifted in the optical system's beam path.It can be used for high-resolution processes under extreme environmental conditions, such as EUV and a dry as well as oxygen-free pure nitrogen atmosphere. Optimizing accuracy in extreme environments • Ideal for miniaturization in automated EUV lithography • Maximizes yield and resolution of existing wafer stepper systems in smallest space (approx. 120 x 180 x 31 mm) • Accuracies up to 1.5 µm under most extreme environmental conditions: EUV, dry, oxygen-free pure nitrogen atmosphere • Maintenance-free and flexible 24/7 operation over many 1,000 positioning cycles, distributed over 10 years Optionally expandable: • Different travels • Material selection and vacuum lubrication adapted to the application • Individual solutions for integration into the customer-specific application • Version for clean room ISO 14644-1 (up to class 1 on request)