XY positioning system 782344:025.26

lineardouble trunnionfor clean rooms

Double XY linear axis for high-precision adjustment of lenses for wafer steppers | ultra-fine UV exposure in the clean room - Precision Assemblies High precise adjustment of two optics This high-precision double linear axis was developed especially for wafer steppers. Two lenses should be positioned relative to each other and also together with each other to realize even finer structures during UV exposure. This solution consists of two sliding axes on a common guide system. Two moving sliding carriages have three carriages each, which allows them to move partially within each other in order to bring the lenses together as closely as possible. Ultrafine imaging in extremely dry environment • Specifically developed to maximize yield and resolution of wafer stepper systems • Simultaneous positioning of lenses to each other as well as with each other over a travel distance of 350 mm • Repeatability of 1.5 µm under extremely dry cleanroom conditions • Easy maintenance due to a replaceable motor encoder assembly Special features: • UV compatibility • Polished surfaces • Versions for cleanroom ISO 14644-1 (up to class 1 on request) • Immediate use with pre-configured controller incl. exemplary software