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Ultra-high vacuum positioning system LA80-2LA95
multi-axis3-axisXY

Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY - image - 2
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY - image - 3
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY - image - 4
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY - image - 5
Ultra-high vacuum positioning system - LA80-2LA95 - Steinmeyer Mechatronik GmbH - multi-axis / 3-axis / XY - image - 6
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Characteristics

Number of axes
multi-axis, 3-axis, XY, XZ, YZ
Features
linear, vertical, horizontal
Applications
multi-function, optical beam, for wafer inspection and metrology, for the semiconductor industry, vacuum, for hygienic applications, for clean rooms, for geometric alignments
Other characteristics
compact, combined modules, for granite slabs, ultra-high vacuum, crossed roller bearing, with stepper motor

Description

Fast 3-axis UHV system LA80-LA90 UV / UHV / EUV, max. 500 mm travel, 2 µm repeatability, 5 kg load This fast transfer stage is suitable for precise, fast and long-life applications in ultra-high vacuum. It also meets the requirements for use under extreme ultraviolet radiation due to its very low emission and low particle count. The axes are available in sizes LA80, LA95, LA170 and are designed for loads up to 20 kg in vertical operation. This axis combination was developed as part of the “tOMography Nano crYo (OMNY)” mit dem Paul Scherrer Institut (PSI). Precise, fast and durable in ultra-high vacuum • Vacuum: all ranges HV / UHV / EUV up to 10E-11 mbar • Lubrication liquid up to 10E-8 / dryup to 10E-11 mbar • Lifetime in kilometer range without liquid lubrication • Max. Bakeout temperature: 120°C • Available as magnetic version Optionen: • Travels specifically adaptable to your application up to 510 x 80 x 80 mm • Without feedback as pure stepper motor system up to 5 µm repeatability • Outstanding standstill in the nanometer range due to additional piezo pincer brakes in Z and Y • Ball screw in Z and Y for higher speed and longer life with lubrication • Versions for clean room ISO 14644-1 class 4 (up to class 1 on request) References OMNY—A tOMography Nano crYo stage | Review of Scientific Instruments 89, 043706 (2018) | https://doi.org/10.1063/1.5020247

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