PECVD plasma generator TruPlasma DC 4000 (G2)
PVD

PECVD plasma generator - TruPlasma DC 4000 (G2)  - TRUMPF Power electronics - PVD
PECVD plasma generator - TruPlasma DC 4000 (G2)  - TRUMPF Power electronics - PVD
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Characteristics

Other caracteristic
PECVD, PVD

Description

The TruPlasma DC Series 4000 (G2) was specially developed for reactive DC sputtering with heavy materials. The generators, which work with pulsed direct current, are particularly well proven in critical PVD and PECVD processes, which require both the highest coating quality and productivity. The compact DC process power supplies can be used in both pulsed and bias mode – two devices in one housing! High coating quality and productivity Digital signal processing guarantees stable processes and minimal arc-related time losses. The best results, even in critical processes Fast arc handling combined with DC pulse technology minimizes substrate damage. Simple process adjustment Due to a broad frequency spectrum and adjustable reverse voltage. Compact and robust design The integrated chiller saves space and reduces maintenance outlay

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