DC pulsed exitation plasma generator TruPlasma Highpulse 4000 (G2)
PVD

DC pulsed exitation plasma generator - TruPlasma Highpulse 4000 (G2)  - TRUMPF Power electronics - PVD
DC pulsed exitation plasma generator - TruPlasma Highpulse 4000 (G2)  - TRUMPF Power electronics - PVD
DC pulsed exitation plasma generator - TruPlasma Highpulse 4000 (G2)  - TRUMPF Power electronics - PVD - image - 2
DC pulsed exitation plasma generator - TruPlasma Highpulse 4000 (G2)  - TRUMPF Power electronics - PVD - image - 3
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Characteristics

Other caracteristic
DC pulsed exitation, PVD

Description

The generators of the TruPlasma Highpulse Series 4000 (G2) can be used in existing magnetron systems without changes as an alternative to DC sputter generators. They provide highly corrosion-resistant and wear-resistant hard material coatings and are therefore the first choice for high-power impulse magnetron sputtering applications. Impeccable coating results Impeccable peak powers of up to 4 megawatts generate extreme plasma densities with high ion fluxes. Can be used with flexibility Simple adaptation to existing cathode systems and process conditions enables optimal device integration. The first choice for HiPIMS applications As the latest development in pulsed PVD sputtering processes, HiPIMS offers particularly corrosion-resistant and wear-resistant hard material coatings. For a variety of applications Can also be used in DC mode, no additional DC generator required.

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