Wafer cleaning machine

watersprayautomatic

wafer two-fluid centrifiigal cleaning machine, also called wafer cleaning equipment, bismuth telluride wafer cleaning machine, automatic two-fluid centrifugal cleaning machine, semiconductor wafer cleaning machine. The fully automatic centrifugal cleaning machine equipment is mainly composed of the following components: cleaning tank, spray cleaning and rinsing system, spray cleaning tank, liquid circulation filtration system, reciprocating moving system, pipeline, control system 1 set, built-in cleaning cavity Workbench, water pressure and air pressure monitoring, rack, etc. In order to facilitate transportation, the bottom of the machine is equipped with universal movable casters and supporting feet. The semiconductor wafer cleaning machine is a fully automatic cleaning machine. The cleaning medium is two fluids (city water or pure water and compressed air). The cleaning medium is two fluids (city water or pure water and compress When the cleaning machine is working, the operator puts the hand plate to be cleaned on the workbench. After placing it, manually close the front window. After confirming that it is tightly closed, manually press the cleaning button, and the pneumatic reciprocating mobile spray cleaning starts to clean and rinse the workpiece. When the time arrives, the alarm will alert the staff. The staff takes out the tray and complétés the entire cleaning process. Except for loading and unloading, the entire cleaning and rinsing are fully automatic without manual intervention. The equipment is equipped with an emergency stop switch, so that the opération of the equipment can be quickly stopped in case of emergency.