Critical dimension measuring system MT270UV

opticalfor semiconductorshigh-precision

TZTEK provides high precision and repeatability systems for mask metrology which are required during mask manufacturing. Masks could be GOG and PSM or others. For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range. main features •Mask critical dimension measurement •Available for mask size up to 6 inch •Visible and UV illumination available in transmitted and reflected modes •SECS/GEM •Low maintenance cost, stable and reliable