- Metrology - Laboratory
- Metrology and Test Equipment
- Critical dimension measuring system
- TZTEK Technology Co.,ltd
Critical dimension measuring system MT2010VIS/UVthicknessopticalfor semiconductors
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Characteristics
- Measured physical value
- thickness, critical dimension
- Technology
- optical
- Measured material
- for film, for semiconductors
- Other characteristics
- high-precision
Description
TZTEK provides high precision and repeatability systems for mask metrology which are required during mask manufacturing. Masks could be GOG and PSM or others.
For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range.
main features
•Mask film thickness and critical dimension measurement
•Visible, UV and infrared illumination available
•SECS/GEM
•Low maintenance cost, stable and reliable
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.