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Process gas analyzer QULEE CGM series
residual gasmonitoringprocess

process gas analyzer
process gas analyzer
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Characteristics

Measured entity
process gas, residual gas
Application domain
monitoring, process
Measured value
pressure
Configuration
compact
Other characteristics
control

Description

COMPACT PROCESS GAS MONITOR - QULEE CGM SERIES “Qulee” (pronounced as “KLEE”), is ULVAC’s latest model for residual gas analysis and gas monitoring during process. Feedback from facility engineers in various production lines are incorporated in the new product design offering utmost simplicity. The Qulee offers high accuracy and resolution even at high pressure (1Pa or less).Ideal for Sputtering System Ideal for process monitoring of various sputtering sysytem Differential Pumping System not Required No differential pumping system required (at 1Pa (7.5×10-3 Torr, 1×10-2 mbar) or lower) Integrated Display No need for PC Simple Operation "One Click" function Bake Out Max 120˚C (248˚F) high temperature bake (250˚C (482˚F) when sensors are removed) Degas Function Electron bombard degas Protection and Maintenance Features Ion source and secondary electron multiplier protection maintenance help function Traceability of analysis tube (patent pending) Various Leak Tests are available Helium leak test, air leak test, built-up test Total Pressure Measurement Capable of total pressure measurement (ionization gauge) Qulee QCS is Included This software is included and compatible with (Windows 7/8) QIP (Quick Install Package system) is Included Auto measuring package (refer to options catalog for details) Applicable Standard Conforms with CE Process monitoring for PV, FPD, and semiconductor system Residual gas analysis in PVD system Impurities (H2O, etc.) control in PVD system For leak testing

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