Process gas analyzer QULEE RGM series

monitoringprocesspressure

REACTIVE PROCESS GAS MONITORING SYSTEM - QULEE RGM SERIES This process monitoring system has been developed for various kinds of applications such as etch, CVD and other reactive gas processes. Using ULVAC’s original ion source and pumping system enables you to achieve stable measurements results.Most Appropriate for Etching/CVD Apparatus Long term stable measurements results Closed Ion Source Utilizing a Magnetic Field Soft ionization provides less gas dissociation and higher sensitivity. Decomposition and adsorption due to thermal reactions are minimized in the ionization chamber. Compact Conductance Valve with 3 Different Gas Inlet Modes Short distance between the process chamber and ion source allows quick-response of analysis. Suitable for Process Monitoring Wide pressure range from 1×10-6 to 13kPa (7.5×10-9 to 97.5 Torr, 1×10-8 to 130mbar) is available. (Choice of oriices) Integrated Display No need for PC Simple Operation "One Click" function Bake Out Max 120˚C (248˚F) High temperature bake Degas Function Electron bombard degas Protection and Maintenance Feautures Protection and maintenance of ion source and secondary electron multiplier Traceability of analysis tube (patent pending) Various Leak Tests are Available Helium leak test, air leak test, leak up Total Pressure Measurement Capable of total pressure measurement (External ionization gauge (GI-M2) Qulee QCS is Included This software is included and compatible with (Windows XP/7)