compact, high-performance, for corrosive environments, with stepper motor
DN
200 mm, 250 mm (7.874 in, 9.843 in)
Temperature
Min.: 0 °C (32 °F)
Max.: 120 °C (248 °F)
Description
Optimized for corrosive semiconductor and FPD processes (e. g. etching) and for cleaning processes between deposition processes. In control mode, the valve works virtually particle-free. Maintenance can be done easy and fast. An advantage is the extended control range.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.