Ion sputtering source

16cm RF Ion Source Broad, Uniform RF Ion Source for Highly Reactive Processes Veeco offers a broad uniform ion beam source for reactive processes, such as ion beam assist or ion beam deposition of highly controlled optical coatings. Supports wide range of operation: 50 to 1500eV and 75 to 700mA Reliable, uniform operation in both inert and oxidizing environments Water-cooled - For low-to-high power operation Optional four-grid design offers very high collimation Features the industry's only filamentless RF Neutralizer, which provides low maintenance and enables long production runs Stable and efficient plasma operation allows precise control and high repeatability Well-suited to both batch and load-locked production processes