Ion sputtering source Mark II+

Stretched shaft yield and improved upkeep attributes Drastically extended shaft current and removable anode get-together builds estimation of the Mark Ii+ End-Hall Ion Source,giving evolutionary change to Veeco's industry-heading line gridless molecule hotspots for optical blanket structures.Up to 70% more noticeable shaft present for higher-rate strategies and greater chambers Removable anode social event engages quicker upkeep and less downtime Joined feedthroughs and cabling for straightforwardness of-foundation and steadfastness Suitable for responsive and torpid gasses and high power densities More unassuming structure variable usage same mounting plate for speedier overhauls Adaptable compromise licenses space-saving skeleton design and far reaching shaft edge