PVD deposition machine NEXUS PVD-1

thermal evaporationthin-filmfor optoelectronics

Veeco's NEXUS PVD-1 is a single wafer physical vapor deposition system. It is versatile, easy-to-use tool for multiple applications. It guarantees simplicity, reliability and performance during any operation. The system can be custom-made to multiple data storage applications like oxide and nitride deposition and variety of magnetic materials. It can be purchased with a wide range of wafer sizes and a high-performance, cost-effective tool for semiconductor, GaAs and packaging applications. This physical vapor deposition system can be easily shaped to meet particular process and production requirements. It supports a different wafer sizes from 3" to 8" round. The entire package includes cathodes, wafer chucks, gas manifolds, shutters and pumping packages. It is designed for simple and fast integration with NEXUS Ion Beam Etch, Ion Beam Deposition and other physical vapor deposition tools. The provided modularity simplifies operator and maintenance training requests as well as spare part stocking.