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MOCVD deposition machine TurboDisc EPIK 868
sputteringthin-filmwith rotating cathodes

MOCVD deposition machine
MOCVD deposition machine
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Characteristics

Method
MOCVD
Technology
sputtering
Deposition type
thin-film
Other characteristics
with rotating cathodes

Description

Leading-Edge Performance with Maximum Capital Efficiency & Footprint Savings Veeco’s EPIK® 868 is the LED industry’s highest performance MOCVD system that enables superior uniformity and repeatability with low defectivity. Available in a four-reactor configurations, EPIK 868 features breakthrough technologies including the proprietary IsoFlange™ and TruHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer carrier. These technological innovations drive higher yields required for mini and micro LEDs. Inherent in EPIK 868 is the TurboDisc® technology which enables highest system availability and uptime. Designed for mass production, EPIK 868 high capacity carrier accommodates multiple 4” or 6” wafer sizes for the lowest cost of ownership. Customers can easily transfer processes from existing TurboDisc systems to the new EPIK 868 MOCVD platform for quick-start production of high quality mini and micro LEDs. Excellent uniformity with low defectivity Compact cluster architecture High throughput architecture for maximum production

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.