Chamber oven VIR
infrared

Chamber oven - VIR - Weiss Technik - infrared
Chamber oven - VIR - Weiss Technik - infrared
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Characteristics

Configuration
chamber
Heat source
infrared
Maximum temperature

Min.: 300 °C
(572 °F)

Max.: 3,000 °C
(5,432 °F)

Description

Using infrared technology, energy can be transferred in the form of electromagnetic radiation without any direct contact or even a carrier medium (e.g., water, etc.). As a result, the infrared heat is also suitable for particularly challenging areas of use (e.g., in vacuums and in clean room conditions). The areas of use include the paper, printing and textile industries, glass, ceramic and plastic technologies, composite materials and coating materials. The emission performance of the IR radiator can be optimally adjusted to the absorption properties of the product to be treated. In order to design an infrared system, several physical parameters of the product to be treated must be known. It is possible to carry out infrared tests at our facilities in order to determine these parameters. Your advantages: • Fast heating thanks to low heat-up and cool-down rates • Transfer of high heat outputs • Can be combined with other Vötsch device concepts. Long-wave to short-wave infrared radiators with operating temperatures between 300 °C and 3000 °C are available

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